Remote-Coupled Oxygen Plasma Harmonic Measurements for Process Monitoring

Law, V.J.; Bergamini, S.; Kenyon, A.J.; Thornhill, N.F.; Lee, K.; Watkins, M. and Lea, L. (2003). Remote-Coupled Oxygen Plasma Harmonic Measurements for Process Monitoring. In: Gerard, Francois ed. Advance in Plasma Physics Research. Advances in Plasma Physics Research, 4. New York, NY, USA: Nova Science, pp. 141–157.

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Abstract

About the book: This book presents state-of-the-art analysis of developments in plasma physics.

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About

• Item ORO ID
• 6804
• Item Type
• Book Section
• ISBN
• 1-59033-629-1, 978-1-59033-629-8
• Academic Unit or School
• Faculty of Science, Technology, Engineering and Mathematics (STEM) > Physical Sciences
  Faculty of Science, Technology, Engineering and Mathematics (STEM)
• Research Group
• Physics
• Depositing User
• Silvia Bergamini