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Darnon, Maxime; Cunge, Gilles and Braithwaite, Nicholas St.J
(2014).
DOI: https://doi.org/10.1088/0963-0252/23/2/025002
Abstract
The resurgence of industrial interest in pulsed radiofrequency plasmas for etching applications highlights the fact that these plasmas are much less well characterized than their continuous wave counterparts. A capacitively coupled planar probe is used to determine the time variations of the ion flux, electron temperature (of the high-energy tail of the electron energy distribution function) and plasma density. For a pulsing frequency of 1 kHz or higher, the plasma never reaches a steady state during the on-time and is not fully extinguished during the off-time. The drop of plasma density during the off-time leads to an overshoot in the electron temperature at the beginning of each pulse, particularly at low frequencies, in good agreement with modeling results from the literature.
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About
- Item ORO ID
- 39649
- Item Type
- Journal Item
- ISSN
- 1361-6595
- Keywords
- pulsed plasma; ion flux; time resolved; planar probe
- Academic Unit or School
-
Faculty of Science, Technology, Engineering and Mathematics (STEM) > Physical Sciences
Faculty of Science, Technology, Engineering and Mathematics (STEM) - Research Group
- Physics
- Copyright Holders
- © 2014 IOP Publishing Ltd.
- Depositing User
- N St.J Braithwaite