Effect of power modulation on properties of pulsed capacitively coupled radiofrequency discharges

Šamara, V.; Bowden, M. D. and Braithwaite, N. St. J. (2010). Effect of power modulation on properties of pulsed capacitively coupled radiofrequency discharges. Journal of Physics D: Applied Physics, 43(12) p. 124017.

DOI: https://doi.org/10.1088/0022-3727/43/12/124017

Abstract

We describe measurements of plasma properties of pulsed, low pressure, capacitively coupled discharges operated in argon. The study aims to determine the effect of modulating the radiofrequency power during the discharge part of the pulse cycle. Measurements of local electron density and optical emission were made in capacitively coupled rf discharges generated in a Gaseous Electronics Conference (GEC) reference reactor. Gas pressure was in the range 7–70 Pa, rf power in the range 1–100 W and pulse durations in the range 10 µs–100 ms. The results indicate that the ignition and afterglow decay processes in pulsed discharges can be controlled by modulating the shape of applied radiofrequency pulse.

Viewing alternatives

Metrics

Item Actions

Export

You can export this page using these formats Digital Object Identifier - DOI

About

• Item ORO ID
• 22498
• Item Type
• Journal Item
• ISSN
• 1361-6463
• Project Funding Details

• Funded Project Name	Project ID	Funding Body
  Not Set	Not Set	Oxford Instruments Plasma Technology

• Academic Unit or School
• Faculty of Science, Technology, Engineering and Mathematics (STEM) > Physical Sciences
  Faculty of Science, Technology, Engineering and Mathematics (STEM)
• Research Group
• Physics
• Copyright Holders
• © 2010 IOP Publishing Ltd
• Depositing User
• Vladimir Šamara