LEPECVD — A Production Technique for SiGe MOSFETs and MODFETs

Chrastina, D.; Rössner, B.; Isella, G.; von Käenel, H.; Hague, J. P.; Hackbarth, T.; Herzog, H.-J.; Hieber, K.-H. and Köenig, U. (2005). LEPECVD — A Production Technique for SiGe MOSFETs and MODFETs. In: ed. Materials for Information Technology. Engineering Materials and Processes (1). London, UK: Springer, pp. 17–29.

DOI: https://doi.org/10.1007/1-84628-235-7_2

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• Item ORO ID
• 12303
• Item Type
• Book Section
• ISBN
• 1-85233-941-1, 978-1-85233-941-8
• ISSN
• 1619-0181
• Academic Unit or School
• Faculty of Science, Technology, Engineering and Mathematics (STEM) > Physical Sciences
  Faculty of Science, Technology, Engineering and Mathematics (STEM)
• Research Group
• Physics
• Depositing User
• James Hague