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Verdonck, P.; Goodyear, A.; Mansano, R.D.; Barroy, P.R.J. and Braithwaite, N St.J. (2002). Importance of fluorine surface diffusion for plasma etching of silicon. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 20(3) pp. 791–796.

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