Remote-Coupled Oxygen Plasma Harmonic Measurements for Process Monitoring

Law, V.J.; Bergamini, S.; Kenyon, A.J.; Thornhill, N.F.; Lee, K.; Watkins, M. and Lea, L. (2003). Remote-Coupled Oxygen Plasma Harmonic Measurements for Process Monitoring. In: Gerard, Francois ed. Advance in Plasma Physics Research. Advances in Plasma Physics Research, 4. New York, NY, USA: Nova Science, pp. 141–157.

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About the book: This book presents state-of-the-art analysis of developments in plasma physics.

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