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Remote-Coupled Oxygen Plasma Harmonic Measurements for Process Monitoring

Law, V.J.; Bergamini, S.; Kenyon, A.J.; Thornhill, N.F.; Lee, K.; Watkins, M. and Lea, L. (2003). Remote-Coupled Oxygen Plasma Harmonic Measurements for Process Monitoring. In: Gerard, Francois ed. Advance in Plasma Physics Research. Advances in Plasma Physics Research, 4. New York, NY, USA: Nova Science, pp. 141–157.

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About the book: This book presents state-of-the-art analysis of developments in plasma physics.

Item Type: Book Chapter
ISBN: 1-59033-629-1, 978-1-59033-629-8
Academic Unit/Department: Science > Physical Sciences
Interdisciplinary Research Centre: Centre for Earth, Planetary, Space and Astronomical Research (CEPSAR)
Item ID: 6804
Depositing User: Silvia Bergamini
Date Deposited: 13 Feb 2007
Last Modified: 14 Jan 2016 16:27
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