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Influence of photo-initiator concentration on residual mechanical stress in SU-8 thin films

Psoma, S.D.; Jenkins, D.W.K.; Derbyshire, G.E. and Stevens, R. (2006). Influence of photo-initiator concentration on residual mechanical stress in SU-8 thin films. TechConnect Briefs, 1 pp. 79–82.

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In this paper, experimental results on the residual mechanical stress generated during the different steps of the photolithography process of SU-8 thin films using different photo-initiator concentrations are presented. The main aim of the reported research work has been firstly to investigate and identify the causes for the generation of residual stresses and secondly to optimise the fabrication process in order to minimise the residual stresses. It was found that the major parameters that influence the generation of internal stresses were the exposure time, the post-baking temperature and time and the concentration of the photoinitiator which is used (Cyracure UVI). At lower concentrations of the photo-initiator, the measured stress levels after the post-baking step were consistently found to be significantly lower than the ones corresponding to higher photo-initiator concentrations. In addition, there was an additional improvement by using a ramping hot-plate. Finally, preliminary experiments were carried out in order to encapsulate nanoparticles in these low stress SU-8 thin films.

Item Type: Journal Item
Extra Information: This issue publishes the Technical Proceedings of the 2006 NSTI Nanotechnology Conference and Trade Show over two volumes.
Keywords: SU-8 films; residual stress; photo-initiator; fabrication; negative photoresist
Academic Unit/School: Faculty of Science, Technology, Engineering and Mathematics (STEM) > Engineering and Innovation
Faculty of Science, Technology, Engineering and Mathematics (STEM)
Research Group: Smart Materials
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Item ID: 60031
Depositing User: Sotiria Psoma
Date Deposited: 26 Mar 2019 14:36
Last Modified: 04 Apr 2019 08:42
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