Plasma processing of materials at the atomic scale

Braithwaite, N.St.J. and Matsuura, T. (2004). Plasma processing of materials at the atomic scale. Contributions to Plasma Physics, 44(5-6) pp. 478–484.

DOI: https://doi.org/10.1002/ctpp.200410067

Abstract

Plasma etching is finding new applications beyond the microelectronics industry. There are new challenges in the devising and controlling of plasma-surface interactions. Atomic monolayers offer opportunities for passivation and etching. Maintaining appropriate plasma conditions to exploit such opportunities requires intelligent strategies for the control of processing plasmas.

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