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Plasma processing of materials at the atomic scale

Braithwaite, N.St.J. and Matsuura, T. (2004). Plasma processing of materials at the atomic scale. Contributions to Plasma Physics, 44(5-6) pp. 478–484.

DOI (Digital Object Identifier) Link: http://dx.doi.org/10.1002/ctpp.200410067
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Abstract

Plasma etching is finding new applications beyond the microelectronics industry. There are new challenges in the devising and controlling of plasma-surface interactions. Atomic monolayers offer opportunities for passivation and etching. Maintaining appropriate plasma conditions to exploit such opportunities requires intelligent strategies for the control of processing plasmas.

Item Type: Journal Article
ISSN: 0863-1042
Keywords: plasma-material interactions; plasma etching; monolayers
Academic Unit/Department: Science > Physical Sciences
Interdisciplinary Research Centre: Centre for Earth, Planetary, Space and Astronomical Research (CEPSAR)
eSTEeM
Item ID: 4938
Depositing User: Users 6041 not found.
Date Deposited: 17 Jul 2006
Last Modified: 05 Mar 2014 10:45
URI: http://oro.open.ac.uk/id/eprint/4938
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