Braithwaite, N.St.J. and Matsuura, T.
(2004).
Plasma processing of materials at the atomic scale.
Contributions to Plasma Physics, 44(5-6),
pp. 478–484.
Abstract
Plasma etching is finding new applications beyond the microelectronics industry. There are new challenges in the devising and controlling of plasma-surface interactions. Atomic monolayers offer opportunities for passivation and etching. Maintaining appropriate plasma conditions to exploit such opportunities requires intelligent strategies for the control of processing plasmas.
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