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Direct e-beam lithography of PDMS

Bowen, J.; Cheneler, D. and Robinson, A. P. G. (2011). Direct e-beam lithography of PDMS. In: 37th International Conference on Micro and Nano Engineering, 19-22 September 2011, Berlin, Germany.

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Abstract

Poly-(dimethyl siloxane) (PDMS) is a versatile material frequently used in the fabrication of micro and nano scale devices. It has a unique combination of properties including excellent thermal and chemical stability and non-toxicity making it an attractive material for use in many fields of science, especially in biomedical research. Its sensitivity to electron radiation has led to its use as a resist for subsequent substrate patterning albeit generally in a modified form. Here we analyze the effects of exposing liquid PDMS to electron radiation over a large range of doses on the resulting elastic modulus and topography. The data shows that PDMS processed using e-beam lithographic techniques is a viable structural material capable of being utilized in the next generation of microfluidic and other micro devices.

Item Type: Conference or Workshop Item
Copyright Holders: 2011 The Authors
Academic Unit/School: Faculty of Science, Technology, Engineering and Mathematics (STEM) > Engineering and Innovation
Faculty of Science, Technology, Engineering and Mathematics (STEM)
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Item ID: 43406
Depositing User: James Bowen
Date Deposited: 17 Jun 2015 10:23
Last Modified: 16 Nov 2016 20:57
URI: http://oro.open.ac.uk/id/eprint/43406
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