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Time-resolved ion flux, electron temperature and plasma density measurements in a pulsed Ar plasma using a capacitively coupled planar probe

Darnon, Maxime; Cunge, Gilles and Braithwaite, Nicholas St.J (2014). Time-resolved ion flux, electron temperature and plasma density measurements in a pulsed Ar plasma using a capacitively coupled planar probe. Plasma Sources Science and Technology, 23(2), article no. 025002.

DOI (Digital Object Identifier) Link: https://doi.org/10.1088/0963-0252/23/2/025002
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Abstract

The resurgence of industrial interest in pulsed radiofrequency plasmas for etching applications highlights the fact that these plasmas are much less well characterized than their continuous wave counterparts. A capacitively coupled planar probe is used to determine the time variations of the ion flux, electron temperature (of the high-energy tail of the electron energy distribution function) and plasma density. For a pulsing frequency of 1 kHz or higher, the plasma never reaches a steady state during the on-time and is not fully extinguished during the off-time. The drop of plasma density during the off-time leads to an overshoot in the electron temperature at the beginning of each pulse, particularly at low frequencies, in good agreement with modeling results from the literature.

Item Type: Journal Item
Copyright Holders: 2014 IOP Publishing Ltd.
ISSN: 1361-6595
Keywords: pulsed plasma; ion flux; time resolved; planar probe
Academic Unit/School: Faculty of Science, Technology, Engineering and Mathematics (STEM) > Physical Sciences
Faculty of Science, Technology, Engineering and Mathematics (STEM)
Research Group: Physics
Item ID: 39649
Depositing User: N St.J Braithwaite
Date Deposited: 05 Mar 2014 13:16
Last Modified: 07 Dec 2018 10:21
URI: http://oro.open.ac.uk/id/eprint/39649
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