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Gold film with gold nitride — a conductor but harder than gold

Šiller, L.; Peltekis, N.; Krishnamurthy, S.; Chao, Y.; Bull, S. J. and Hunt, M. R. C. (2005). Gold film with gold nitride — a conductor but harder than gold. Applied Physics Letters, 86(22), article no. 221912.

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DOI (Digital Object Identifier) Link: https://doi.org/10.1063/1.1941471g
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Abstract

The formation of surface nitrides on gold films is a particularly attractive proposition, addressing the need to produce harder, but still conductive, gold coatings which reduce wear but avoid the pollution associated with conventional additives. Here we report production of large area gold nitride films on silicon substrates, using reactive ion sputtering and plasma etching, without the need for ultrahigh vacuum. Nanoindentation data show that gold nitride films have a hardness, 50% greater than that of pure gold. These results are important for large-scale applications of gold nitride in coatings and electronics.

Item Type: Journal Item
Copyright Holders: 2005 American Institute of Physics
ISSN: 1077-3118
Extra Information: 3 pp.
Keywords: gold; metallic thin films; gold compounds; hardness; wear resistant coatings; sputtered coatings; sputter etching; indentation
Academic Unit/School: Faculty of Science, Technology, Engineering and Mathematics (STEM) > Engineering and Innovation
Faculty of Science, Technology, Engineering and Mathematics (STEM)
Item ID: 38649
Depositing User: Satheesh Krishnamurthy
Date Deposited: 02 Oct 2013 13:48
Last Modified: 07 Dec 2018 23:26
URI: http://oro.open.ac.uk/id/eprint/38649
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