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Chroneos, A. and Dimoulas, A.
(2012).
DOI: https://doi.org/10.1063/1.3679089
Abstract
At germanium/high-k interfaces cations and oxygen interstitials can diffuse into the germanium substrate. Here we employ density functional theory calculations to investigate the interaction of a range of such cations (Al, Y, Zr, Nb, La, and Hf) with intrinsic defects and oxygen in germanium. It is predicted that high-k cations strongly bind with lattice vacancies, oxygen interstitials, and A-centers. The implications for microelectronic device performance are discussed. (C) 2012 American Institute of Physics.
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- Item ORO ID
- 35255
- Item Type
- Journal Item
- ISSN
- 0021-8979
- Extra Information
- This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.
- Academic Unit or School
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Faculty of Science, Technology, Engineering and Mathematics (STEM) > Engineering and Innovation
Faculty of Science, Technology, Engineering and Mathematics (STEM) - Copyright Holders
- © 2012 American Institute of Physics
- Depositing User
- Alexander Chroneos