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Phosphorous clustering in germanium-rich silicon germanium

Chroneos, A.; Bracht, H.; Grimes, R. W. and Uberuaga, B. P. (2008). Phosphorous clustering in germanium-rich silicon germanium. Materials Science and Engineering B, 154-55 pp. 72–75.

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URL: http://www.sciencedirect.com/science/article/pii/S...
DOI (Digital Object Identifier) Link: http://dx.doi.org/10.1016/j.mseb.2008.08.005
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Abstract

The formation of clusters consisting of donor atoms and lattice vacancies can deleteriously affect the performance of silicon germanium devices. In the present study results from electronic structure calculations are evaluated using mass action analysis to identify the extent to which phosphorous-vacancy clusters form in germanium-rich silicon germanium. Although it is energetically favourable to form clusters containing up to four phosphorous atoms, clusters are only important at lower temperatures. At such temperatures the formation of the cluster, in which four phosphorous atoms are tetrahedrally coordinated around a vacancy. is especially stable. At high temperatures unbound vacancies and phosphorous atoms are dominant.

Item Type: Journal Article
Copyright Holders: 2008 Elsevier B.V.
ISSN: 0921-5107
Keywords: germanium; SiGe; phosphorous; density functional theory
Academic Unit/Department: Mathematics, Computing and Technology > Engineering & Innovation
Item ID: 35178
Depositing User: Alexander Chroneos
Date Deposited: 07 Nov 2012 12:05
Last Modified: 07 Nov 2012 22:19
URI: http://oro.open.ac.uk/id/eprint/35178
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