Mitea, S.; Zelznik, M.; Bowden, M. D.; May, P. W.; Fox, N. A.; Hart, J. N.; Fowler, C.; Stevens , R. and Braithwaite, N. StJ.
Generation of microdischarges in diamond substrates.
Plasma Sources Science and Technology, 21(2), article no. 022001.
We report the generation of microdischarges in devices composed of microcrystalline diamond. Discharges were generated in device structures with microhollow cathode discharge geometries. One structure consisted of an insulating diamond wafer coated with boron-doped diamond layers on both sides. A second structure consisted of an insulating diamond wafer coated with metal layers on both sides. In each case, a single sub-millimetre hole was machined through the conductor–insulator–conductor structure. The discharges were generated in a helium atmosphere. Breakdown voltages were around 500 V and discharge currents in the range 0.1–2.5 mA were maintained by a sustaining dc voltage of 300 V.
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