Rozum, I.; Limão-Vieira, P.; Eden, S.; Mason, N. J. and Tennyson, J.
Electron interaction cross sections for CF3I, C2F4, and CFx (x=1-3) radicals.
Journal of Physical and Chemical Reference Data , 35(1) pp. 267–285.
The supply of absolute electron-impact cross sections for molecular targets and radicals is extremely important for developing plasma reactors and testing different types of etching gases. Current demand for such models is high as the industry aims to replace traditional plasma processing gases with less polluting species. New theoretical electron impact cross sections at typical etching plasma energies
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