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Effect of power modulation on properties of pulsed capacitively coupled radiofrequency discharges

Šamara, V.; Bowden, M. D. and Braithwaite, N. St. J. (2010). Effect of power modulation on properties of pulsed capacitively coupled radiofrequency discharges. Journal of Physics D: Applied Physics, 43(12) p. 124017.

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We describe measurements of plasma properties of pulsed, low pressure, capacitively coupled discharges operated in argon. The study aims to determine the effect of modulating the radiofrequency power during the discharge part of the pulse cycle. Measurements of local electron density and optical emission were made in capacitively coupled rf discharges generated in a Gaseous Electronics Conference (GEC) reference reactor. Gas pressure was in the range 7–70 Pa, rf power in the range 1–100 W and pulse durations in the range 10 µs–100 ms. The results indicate that the ignition and afterglow decay processes in pulsed discharges can be controlled by modulating the shape of applied radiofrequency pulse.

Item Type: Journal Article
Copyright Holders: 2010 IOP Publishing Ltd
ISSN: 1361-6463
Project Funding Details:
Funded Project NameProject IDFunding Body
Not SetNot SetOxford Instruments Plasma Technology
Academic Unit/Department: Science > Physical Sciences
Interdisciplinary Research Centre: Centre for Earth, Planetary, Space and Astronomical Research (CEPSAR)
Item ID: 22498
Depositing User: Vladimir Šamara
Date Deposited: 02 Aug 2010 10:23
Last Modified: 21 Jun 2016 15:15
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