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LEPECVD — A Production Technique for SiGe MOSFETs and MODFETs

Chrastina, D.; Rössner, B.; Isella, G.; von Käenel, H.; Hague, J. P.; Hackbarth, T.; Herzog, H.-J.; Hieber, K.-H. and Köenig, U. (2005). LEPECVD — A Production Technique for SiGe MOSFETs and MODFETs. In: ed. Materials for Information Technology. Engineering Materials and Processes (1). London, UK: Springer, pp. 17–29.

DOI (Digital Object Identifier) Link: https://doi.org/10.1007/1-84628-235-7_2
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Abstract

Abstract not available.

Item Type: Book Section
ISBN: 1-85233-941-1, 978-1-85233-941-8
ISSN: 1619-0181
Academic Unit/School: Faculty of Science, Technology, Engineering and Mathematics (STEM) > Physical Sciences
Faculty of Science, Technology, Engineering and Mathematics (STEM)
Research Group: Physics
Item ID: 12303
Depositing User: James Hague
Date Deposited: 17 Nov 2008 13:12
Last Modified: 07 Dec 2018 09:14
URI: http://oro.open.ac.uk/id/eprint/12303
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