LEPECVD — A Production Technique for SiGe MOSFETs and MODFETs

Chrastina, D.; Rössner, B.; Isella, G.; von Käenel, H.; Hague, J. P.; Hackbarth, T.; Herzog, H.-J.; Hieber, K.-H. and Köenig, U. (2005). LEPECVD — A Production Technique for SiGe MOSFETs and MODFETs. In: ed. Materials for Information Technology. Engineering Materials and Processes (1). London, UK: Springer, pp. 17–29.

DOI: https://doi.org/10.1007/1-84628-235-7_2

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